Laser direct writing of graphene patterns

Graphene will be a key material in emerging technologies due to the ease of manipulation and their unique properties. Up to now, chemical vapor deposition (CVD) is the most promising method due to the benefits of large-scale production of graphene and patterning process for various applications. However a multi-step process with long processes time has to be improved for process innovations. Thus, the overarching goal of this project is to develop an innovative technology of ultra-fast single-step growth for high quality graphene patterns for various applications



Department of Electrical and Computer Engineering
University of Nebraska-Lincoln
209N Scott Engineering Center
P.O. Box 880511
Lincoln, NE 68588-0511, USA


Phone: (402) 472-3771
Fax:     (402) 472-4732



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