Multi-energy material synthesis

This research area is to develop a new multi-laser-beam and low-temperature approach to synthesizing electronic materials on various substrates with optimized efficiency, improved quality, and minimum thermal stress. This synthesizing technique will be customized to specific film/substrate systems through designed reaction paths involving excitation of the precursor molecules, photodissociation and ionization of excited precursor molecules, and controlled plasma cooling and film formation.



Department of Electrical and Computer Engineering
University of Nebraska-Lincoln
209N Scott Engineering Center
P.O. Box 880511
Lincoln, NE 68588-0511, USA


Phone: (402) 472-3771
Fax:     (402) 472-4732



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